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Oxygen ion-beam etch resistance of metal-free and organosilicon resist materials

✍ Scribed by Hiroshi Gokan; Yoshitake Ohnishi; Kazuhide Saigo

Publisher: Elsevier Science
Year: 1983
Tongue: English
Weight: 727 KB
Volume: 1
Category: Article
ISSN: 0167-9317
DOI: 10.1016/0167-9317(83)90015-1

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