The effect of ion implantation on polymer mask resistance to ion beam etching : T. B. Borzenko, A. F. Vyatkin, N. N. Gonchakova, V. I. Zinenko, Yu I. Koval and V. A. Kudryashov. Vacuum 38(11), 1007 (1988)

• Publisher: Elsevier Science
• Year: 1990
• Tongue: English
• Weight: 125 KB
• Volume: 30
• Category: Article
• ISSN: 0026-2714
• DOI: 10.1016/0026-2714(90)90138-d