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Enhanced oxygen reactive ion etching resistance of diazonaphthoquinone-poly(formyloxystyrene) resist system by photoacid catalyzed photo-fries rearrangement and potassium ion treatment in aqueous solution

✍ Scribed by Wen-an Loong; An-na Su


Publisher
Elsevier Science
Year
1991
Tongue
English
Weight
302 KB
Volume
13
Category
Article
ISSN
0167-9317

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