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Fullerite C60 as electron-beam resist for ‘dry’ nanolithography

✍ Scribed by V.V Shnitov; V.M Mikoushkin; Yu.S Gordeev

Publisher
Elsevier Science
Year
2003
Tongue
English
Weight
176 KB
Volume
69
Category
Article
ISSN
0167-9317

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✦ Synopsis

The fullerite C modification induced by electron irradiation was studied using electron energy loss spectroscopy (EELS).

60

We show that prolonged electron irradiation causes gradual transformation of electron and atomic structures of fullerite C 60 films towards respective structures of amorphous carbon. Moreover, strongly modified parts of fullerite C films become 60 thermally unevaporable. A possible mechanism of these effects is suggested. Finally, we propose a new original nanolithography technique based on two key ideas: the use of fullerite films as negative electron-beam resist and development of lithographic images by appropriate thermal treatment of these films.

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