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A polymer complex as a new type of electron beam resist for dry development

✍ Scribed by Sachiko Yoneyama; Kiyoshi Oguchi; Masayoshi Watanabe; Kohei Sanui; Naoya Ogata; Yoichi Takahashi; Tomihiro Nakada

Publisher: Society for Plastic Engineers
Year: 1988
Tongue: English
Weight: 364 KB
Volume: 28
Category: Article
ISSN: 0032-3888
DOI: 10.1002/pen.760281406

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