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Electrochemical performance of CuO nanocrystal film fabricated by room temperature sputtering

✍ Scribed by J.K. Feng; H. Xia; M.O. Lai; L. Lu

Book ID
113787228
Publisher
Elsevier Science
Year
2011
Tongue
English
Weight
334 KB
Volume
46
Category
Article
ISSN
0025-5408

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## Abstract AlN films have been fabricated using a dc magnetron sputtering system under different N~2~ partial pressures, __P__~N~, without substrate heating. X‐ray diffraction revealed that the AlN(002) peak intensity increases first with increasing __P__~N~ (10–40%) and then drops when __P__~N~ i