High performance thin film transistor with HfSiOxdielectric fabricated at room temperature RF-magnetron sputtering

✍ Scribed by Dongkyu Cho, Sanghyun Woo, Jungil Yang, Donghee Lee…

• Book ID: 120723245
• Publisher: The Korean Institute of Metals and Materials
• Year: 2013
• Tongue: English
• Weight: 387 KB
• Volume: 9
• Category: Article
• ISSN: 1738-8090
• DOI: 10.1007/s13391-013-0005-5