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High Quality AlN Thin Films Deposited by Middle-Frequency Magnetron Sputtering at Room Temperature

โœ Scribed by Li, Chuan; Shu, Lin; He, Li Jun; Liu, Xing Zhao

Book ID
124165320
Publisher
Trans Tech Publications, Ltd.
Year
2014
Tongue
English
Weight
672 KB
Volume
787
Category
Article
ISSN
1662-9752

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## Abstract Hexagonal aluminium nitride (AlN) and zinc oxide (ZnO) thin films have been deposited by DC and RF reactive magnetron sputtering at room temperature. For a first set of samples, sputtered AlN films were deposited on silicon ZnO substrate. For a second set, ZnO films were deposited on Al