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Effects of oxygen partial pressures on microstructures and compositions of BaO-SrO-ZnO-Nb2O5thin films by RF-sputtering method

โœ Scribed by Feng Shi; Feifei Ji

Publisher
Springer US
Year
2011
Tongue
English
Weight
664 KB
Volume
22
Category
Article
ISSN
0957-4522

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## Abstract Influences of the different annealing ambient (in air, 1 bar, 2 bar, 3 bar and 4 bar oxygen partial pressure) on the titanium dioxide (TiO~2~) thin films deposited on soda lime glass by standard radio frequency (rf) magnetron reactive sputtering method at 100 watt were investigated by m