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Effect of annealing time on microstructure and morphology of thin films by sputtering deposition with (Ba0.3Sr0.7)(Zn1/3Nb2/3)O3target

โœ Scribed by Feng Shi

Publisher
Springer US
Year
2010
Tongue
English
Weight
463 KB
Volume
22
Category
Article
ISSN
0957-4522

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Effect of deposition temperature on the microstructure and dielectric properties of Ba0.6Sr0.4TiO3thin film deposited by radio-frequency magnetron sputtering
โœ Feng, Zuyong ;Chen, Wei ;Tan, Ooi Kiang ๐Ÿ“‚ Article ๐Ÿ“… 2009 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 322 KB

## Abstract Ba~0.6~Sr~0.4~TiO~3~ (BST) thin films with the thickness of 300 nm were deposited on Pt/SiO~2~/Si substrates at various deposition temperatures by RF magnetron sputtering technique, and their electric properties were investigated. Due to the high temperature annealing process at substra