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Effect of O2 gas partial pressure on structures and dielectric characteristics of rf sputtered ZrO2 thin films

✍ Scribed by C.Y. Ma; F. Lapostolle; P. Briois; Q.Y. Zhang

Publisher
Elsevier Science
Year
2007
Tongue
English
Weight
1009 KB
Volume
253
Category
Article
ISSN
0169-4332

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