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Effect of Sputtering Current on Structure and Morphology of (Ti1-xCrx)N Thin Films Deposited by Reactive Unbalanced Magnetron Co-sputtering

✍ Scribed by C. Paksunchai; S. Denchitcharoen; S. Chaiyakun; P. Limsuwan

Book ID: 119357489
Publisher: Elsevier
Year: 2012
Tongue: English
Weight: 429 KB
Volume: 32
Category: Article
ISSN: 1877-7058
DOI: 10.1016/j.proeng.2012.02.026

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A correlation between the film properties of nitrides, oxides etc., and their structure, is of fundamental importance – not only for thin solid films physics but also for practical applications. The structure of the films depends on deposition methods and their parameters. The relationship between p