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Structural and electrical properties of Ti-W-N thin films deposited by reactive RF sputtering

✍ Scribed by Shun Zhou; Weiguo Liu; Huan Liu; Changlong Cai

Book ID
113846525
Publisher
Elsevier
Year
2011
Tongue
English
Weight
592 KB
Volume
18
Category
Article
ISSN
1875-3892

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A correlation between the film properties of nitrides, oxides etc., and their structure, is of fundamental importance – not only for thin solid films physics but also for practical applications. The structure of the films depends on deposition methods and their parameters. The relationship between p