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Nitrogen effect on the electrical properties of CNx thin films deposited by reactive magnetron sputtering

✍ Scribed by N.E. Derradji; M.L. Mahdjoubi; H. Belkhir; N. Mumumbila; B. Angleraud; P.Y. Tessier


Book ID
108287726
Publisher
Elsevier Science
Year
2005
Tongue
English
Weight
345 KB
Volume
482
Category
Article
ISSN
0040-6090

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Thin films of ZrO 2 were prepared by reactive magnetron sputtering. Annealing of the films exhibited a drastic change in the properties due to improved crystallinity and packing density. The root mean square roughness of the sample observed from atomic force microscope is about 5.75 nm which is comp