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Effect of rapid epitaxy in in situ phosphorus-doped polysilicon emitter on current-gain of bipolar transistors

✍ Scribed by Shiba, T.; Kondo, M.; Uchino, T.; Murakoshi, H.; Tamaki, Y.


Book ID
114536517
Publisher
IEEE
Year
1996
Tongue
English
Weight
770 KB
Volume
43
Category
Article
ISSN
0018-9383

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