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Effect of process parameters on the properties of electron cyclotron resonance plasma deposited silicon-oxynitride

โœ Scribed by Pavel V. Bulkin; Pieter L. Swart; Beatrys M. Lacquet

Book ID
115990393
Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
325 KB
Volume
187
Category
Article
ISSN
0022-3093

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