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Effect of nitrogen gas pressure on residual stress in A1N films deposited by the planar magnetron sputtering system

✍ Scribed by Kazuya Kusaka; Takao Hanabusa; Kikuo Tominaga

Book ID: 113205316
Publisher: Elsevier Science
Year: 1996
Tongue: English
Weight: 371 KB
Volume: 281-282
Category: Article
ISSN: 0040-6090
DOI: 10.1016/0040-6090(96)08633-6

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