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Influence of total gas pressure on the microstructure and properties of CrAlN films deposited by a pulsed DC balanced magnetron sputtering system

โœ Scribed by S. Khamseh; M. Nose; T. Kawabata; K. Matsuda; S. Ikeno


Book ID
116606734
Publisher
Elsevier Science
Year
2010
Tongue
English
Weight
134 KB
Volume
503
Category
Article
ISSN
0925-8388

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