𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Influence of argon gas pressure on the ZnO:Al films deposited on flexible TPT substrates at room temperature by magnetron sputtering

✍ Scribed by Wang, Xiaojing (author);Lei, Qingsong (author);Yuan, Junming (author);Zhou, Wenli (author);Yu, Jun (author)

Publisher
Wuhan University of Technology
Year
2011
Tongue
English
Weight
368 KB
Volume
26
Category
Article
ISSN
1000-2413

No coin nor oath required. For personal study only.

πŸ“œ SIMILAR VOLUMES

Epitaxial growth of ZnO thin films on Al
Epitaxial growth of ZnO thin films on AlN substrates deposited at low temperature by magnetron sputtering
✍ Rahmane, S. ;Abdallah, B. ;Soussou, A. ;Gautron, E. ;Jouan, P.-Y. ;Le Brizoual, πŸ“‚ Article πŸ“… 2010 πŸ› John Wiley and Sons 🌐 English βš– 465 KB

## Abstract Hexagonal aluminium nitride (AlN) and zinc oxide (ZnO) thin films have been deposited by DC and RF reactive magnetron sputtering at room temperature. For a first set of samples, sputtered AlN films were deposited on silicon ZnO substrate. For a second set, ZnO films were deposited on Al

Structure, optical and electrical proper
Structure, optical and electrical properties of Al:ZnO thin films deposited by DC sputtering at room temperature on glass and plastic substrates
✍ GuillΓ©n, C. ;Herrero, J. πŸ“‚ Article πŸ“… 2009 πŸ› John Wiley and Sons 🌐 English βš– 493 KB

## Abstract Transparent and conductive Al‐doped ZnO (AZO) films with thickness between 0.2 and 1.1 ΞΌm were deposited by sputtering at room temperature on glass and polyethylene terephthalate (PET) substrates. All films were polycrystalline with average crystallite size increasing when the film thic