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Effect of N2O plasma treatment on the stabilization of water absorption in fluorinated silicon-oxide thin films fabricated by electron-cyclotron-resonance plasma-enhanced chemical-vapor deposition

✍ Scribed by Kim, S. P.; Choi, S. K.; Park, Youngsoo; Chung, Ilsub

Book ID: 111933874
Publisher: American Institute of Physics
Year: 2002
Tongue: English
Weight: 395 KB
Volume: 80
Category: Article
ISSN: 0003-6951
DOI: 10.1063/1.1458528

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