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Effect of mechanical process parameters on friction behavior and material removal during sapphire chemical mechanical polishing

✍ Scribed by Zefang Zhang; Weixia Yan; Lei Zhang; Weili Liu; Zhitang Song


Book ID
113797827
Publisher
Elsevier Science
Year
2011
Tongue
English
Weight
399 KB
Volume
88
Category
Article
ISSN
0167-9317

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Effect of mechanical process parameters
✍ Woong Cho; Yoomin Ahn; Chang-Wook Baek; Yong-Kweon Kim πŸ“‚ Article πŸ“… 2003 πŸ› Elsevier Science 🌐 English βš– 485 KB

The effects of polishing pressure and abrasive on the chemical mechanical polishing of blanket and patterned aluminum thin films were investigated. The CMP process experiments were conducted using a soft pad and slurry mainly composed of acid solution and Al O abrasive. The result of the blanket fil