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Effect of mechanical anisotropy on material removal rate and surface quality during polishing CdZnTe wafers

โœ Scribed by Yan Li; Wanqi Jie; Renke Kang; Hang Gao


Book ID
107669236
Publisher
Nonferrous Metals Society of China
Year
2011
Tongue
English
Weight
590 KB
Volume
30
Category
Article
ISSN
1001-0521

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