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Effect of Er ion implantation on the physical and electrical properties of TiN/HfO2gate stacks on Si substrate

✍ Scribed by Mei Zhao, RenRong Liang, Jing Wang…

Book ID: 120799793
Publisher: Science in China Press (SCP)
Year: 2013
Tongue: English
Weight: 725 KB
Volume: 56
Category: Article
ISSN: 1672-1799
DOI: 10.1007/s11433-013-5124-3

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