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Effects of NH3 annealing on interface and electrical properties of Gd-doped HfO2/Si stack

✍ Scribed by YANG, Mengmeng; TU, Hailing; DU, Jun; WEI, Feng; XIONG, Yuhua; ZHAO, Hongbin

Book ID: 122408079
Publisher: Elsevier Science
Year: 2013
Tongue: English
Weight: 757 KB
Volume: 31
Category: Article
ISSN: 1002-0721
DOI: 10.1016/S1002-0721(12)60293-2

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