Effect of surface NH[sub 3] anneal on the physical and electrical properties of HfO[sub 2] films on Ge substrate

✍ Scribed by Wu, Nan; Zhang, Qingchun; Zhu, Chunxiang; Yeo, Chia Chin; Whang, S. J.; Chan, D. S. H.; Li, M. F.; Cho, Byung Jin; Chin, Albert; Kwong, Dim-Lee; Du, A. Y.; Tung, C. H.; Balasubramanian, N.

• Book ID: 120482737
• Publisher: American Institute of Physics
• Year: 2004
• Tongue: English
• Weight: 372 KB
• Volume: 84
• Category: Article
• ISSN: 0003-6951
• DOI: 10.1063/1.1737057