On the impact of TiN film thickness variations on the effective work function of poly-Si/TiN/SiO/sub 2/ and poly-Si/TiN/HfSiON gate stacks

✍ Scribed by R. Singanamalla; H. Yu; G. Pourtois; I. Ferain; K. Anil; S. Kubicek; T. Hoffmann; M. Jurczak; S. Biesemans; K. De Meyer

• Book ID: 126699276
• Publisher: IEEE
• Year: 2006
• Tongue: English
• Weight: 219 KB
• Volume: 27
• Category: Article
• ISSN: 0741-3106
• DOI: 10.1109/LED.2006.872916