Effect of an increase in the nitrogen content of the working gas on the microstructure of reactive sputtered TiN thin films

✍ Scribed by S. O. Hyatt; B. S. Chao; H. Yamauchi

• Book ID: 104894432
• Publisher: Springer US
• Year: 1992
• Tongue: English
• Weight: 744 KB
• Volume: 3
• Category: Article
• ISSN: 0957-4522
• DOI: 10.1007/bf00701093