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Distribution of strain in Ge ion implanted silicon measured by high resolution X-ray diffraction

โœ Scribed by A. Pesek; P. Kastler; K. Lischka; L. Palmetshofer


Book ID
113284728
Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
322 KB
Volume
80-81
Category
Article
ISSN
0168-583X

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