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Dislocation free gate process using in situ doped polysilicon thin films by crystallization-induced stress of the films

โœ Scribed by Hashimoto, C.M.; Miura, H.; Asayama, K.; Ohta, H.; Ikeda, S.


Book ID
114535311
Publisher
IEEE
Year
1993
Tongue
English
Weight
277 KB
Volume
40
Category
Article
ISSN
0018-9383

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