Raman scattering analysis of the residual stress in metal-induced crystallized amorphous silicon thin films using nickel

✍ Scribed by Thanh Nga Nguyen; Van Duy Nguyen; Sungwook Jung; Junsin Yi

• Book ID: 108064011
• Publisher: Elsevier Science
• Year: 2009
• Tongue: English
• Weight: 376 KB
• Volume: 255
• Category: Article
• ISSN: 0169-4332
• DOI: 10.1016/j.apsusc.2009.05.087