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Diffusion of silicon in titanium nitride films. Efficiency of TiN barrier layers

✍ Scribed by K. G. Grigorov; G. I. Grigorov; M. Stoyanova; J. L. Vignes; J. P. Langeron; P. Denjean; J. Perriere

Publisher: Springer
Year: 1992
Tongue: English
Weight: 251 KB
Volume: 55
Category: Article
ISSN: 1432-0630
DOI: 10.1007/bf00348340

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