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Diffusion of hydrogen in low pressure chemical vapour deposited silicon nitride films

✍ Scribed by W.M. Arnold Bik; R.N.H. Linssen; F.H.P.M. Habraken; W.F. van der Weg; A.E.T. Kuiper

Publisher: Elsevier Science
Year: 1990
Tongue: English
Weight: 199 KB
Volume: 41
Category: Article
ISSN: 0042-207X
DOI: 10.1016/0042-207x(90)93860-l

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