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Characterization of low pressure chemically vapour- deposited thin silicon nitride films

✍ Scribed by L.I. Popova; B.Z. Antov; A.V. Shopov; M.S. Sotirova; G.D. Beshkov; E.N. Stefanov

Publisher: Elsevier Science
Year: 1984
Tongue: English
Weight: 717 KB
Volume: 122
Category: Article
ISSN: 0040-6090
DOI: 10.1016/0040-6090(84)90005-1

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