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Diffusion of boron and arsenic implants in 〈111〉 and 〈100〉 Si during rapid thermal annealing

✍ Scribed by R. Kalish; G.S. Oehrlein; V.R. Deline; S.A. Cohen

Book ID: 113277281
Publisher: Elsevier Science
Year: 1985
Tongue: English
Weight: 563 KB
Volume: 7-8
Category: Article
ISSN: 0168-583X
DOI: 10.1016/0168-583x(85)90575-0

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