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Diffusion and segregation of arsenic and boron in polysilicon/silicon systems during rapid thermal annealing

✍ Scribed by A. Merabet

Book ID: 116598071
Publisher: Elsevier Science
Year: 2004
Tongue: English
Weight: 110 KB
Volume: 382
Category: Article
ISSN: 0925-8388
DOI: 10.1016/j.jallcom.2004.05.028

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