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Activation and diffusion during rapid thermal annealing of arsenic and boron implanted silicon

✍ Scribed by J.J. Grob; S. Unamuno; A. Grob; M. Ajaka; A. Slaoui; R. Stuck

Book ID: 114168114
Publisher: Elsevier Science
Year: 1987
Tongue: English
Weight: 401 KB
Volume: 19-20
Category: Article
ISSN: 0168-583X
DOI: 10.1016/s0168-583x(87)80100-3

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