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The enhanced diffusion of boron in silicon after high-dose implantation and during rapid thermal annealing

✍ Scribed by F. Marou; A. Claverie; Ph. Salles; A. Martinez


Book ID
113282460
Publisher
Elsevier Science
Year
1991
Tongue
English
Weight
885 KB
Volume
55
Category
Article
ISSN
0168-583X

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