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Rapid thermal anneal of arsenic implanted into Si(100) and Si(111)

✍ Scribed by A. Feygenson; J.N. Zemel

Publisher: Elsevier Science
Year: 1987
Tongue: English
Weight: 353 KB
Volume: 149
Category: Article
ISSN: 0040-6090
DOI: 10.1016/0040-6090(87)90294-x

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