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DFT investigation of HfCl4 decomposition on hydroxylated SiO2: first stage of HfO2 atomic layer deposition

✍ Scribed by A. Estève; M. Djafari Rouhani; L. Jeloaica; D. Estève

Book ID: 117626839
Publisher: Elsevier Science
Year: 2003
Tongue: English
Weight: 161 KB
Volume: 27
Category: Article
ISSN: 0927-0256
DOI: 10.1016/s0927-0256(02)00428-7

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