✦ LIBER ✦
In Situ Auger Electron Spectroscopy Study of Atomic Layer Deposition: Growth Initiation and Interface Formation Reactions during Ruthenium ALD on Si−H, SiO 2 , and HfO 2 Surfaces
✍ Scribed by Park, Kie Jin; Terry, David B.; Stewart, S. Michael; Parsons, Gregory N.
- Book ID
- 126098089
- Publisher
- American Chemical Society
- Year
- 2007
- Tongue
- English
- Weight
- 401 KB
- Volume
- 23
- Category
- Article
- ISSN
- 0743-7463
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