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Preparation of HfO2 nano-films by atomic layer deposition using HfCl4 and O2 under atmospheric pressure

✍ Scribed by Shinichi Nonobe; Naoyuki Takahashi; Takato Nakamura

Book ID
113912848
Publisher
Elsevier Science
Year
2004
Tongue
English
Weight
155 KB
Volume
6
Category
Article
ISSN
1293-2558

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