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Development of the self-aligned titanium silicide process for VLSI applications

✍ Scribed by Alperin, M.E.; Holloway, T.C.; Haken, R.A.; Gosmeyer, C.D.; Karnaugh, R.V.; Parmantie, W.D.


Book ID
114595046
Publisher
IEEE
Year
1985
Tongue
English
Weight
821 KB
Volume
32
Category
Article
ISSN
0018-9383

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