Comparison of self-aligned silicide technologies for shallow CoSi2-contacts in VLSI-devices

✍ Scribed by C. Schäffer; D. Depta; L. Niewöhner

• Publisher: Elsevier Science
• Year: 1992
• Tongue: English
• Weight: 233 KB
• Volume: 19
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/0167-9317(92)90519-w