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Development of a focused-ion-beam lithography system

✍ Scribed by H. Sawaragi; R. Aihara; S. Matsui; K. Mori; M.Hassel Shearer

Book ID: 107920350
Publisher: Elsevier Science
Year: 1987
Tongue: English
Weight: 323 KB
Volume: 6
Category: Article
ISSN: 0167-9317
DOI: 10.1016/0167-9317(87)90061-x

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