✦ LIBER ✦

High energy focused ion beam lithography using P-beam writing

✍ Scribed by Gary A. Glass; Bibhudutta Rout; Alexander D. Dymnikov; Richard R. Greco; Mithun Kamal; James R. Reinhardt; John A. Peeples

Publisher: Elsevier Science
Year: 2005
Tongue: English
Weight: 470 KB
Volume: 241
Category: Article
ISSN: 0168-583X
DOI: 10.1016/j.nimb.2005.07.048

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Focused ion beam lithography using Al2O3

Focused ion beam lithography using Al2O3 resist

✍ Tsuneaki Ohta; Toshihiko Kanayama; Masanori Komuro 📂 Article 📅 1987 🏛 Elsevier Science 🌐 English ⚖ 356 KB

Proton beam writing using the high energ

Proton beam writing using the high energy ion nanoprobe LIPSION

✍ F. Menzel; D. Spemann; J. Lenzner; J. Vogt; T. Butz 📂 Article 📅 2005 🏛 Elsevier Science 🌐 English ⚖ 264 KB

Proton beam writing (PBW) is a very unique technique capable of the direct creation of three dimensional structures with a very high aspect ratio. Since the high energy ion nanoprobe LIPSION has a very high spatial resolution and is therefore well suited for the creation of structures in the microme

Writing implantation with a high current

Writing implantation with a high current density focused ion beam

✍ L. Bischoff; E. Hesse; D. Panknin; W. Skorupa; J. Teichert 📂 Article 📅 1994 🏛 Elsevier Science 🌐 English ⚖ 348 KB

High resolution sputtering using a focus

High resolution sputtering using a focused ion beam

✍ R.L. Kubena; R.L. Seliger; E.H. Stevens 📂 Article 📅 1982 🏛 Elsevier Science 🌐 English ⚖ 482 KB

Ion beam lithography using single ions

✍ A. Alves; P. Reichart; R. Siegele; P.N. Johnston; D.N. Jamieson 📂 Article 📅 2006 🏛 Elsevier Science 🌐 English ⚖ 270 KB

Rapid and three-dimensional nanoimprint

Rapid and three-dimensional nanoimprint template fabrication technology using focused ion beam lithography

✍ Jun Taniguchi; Kentaro Koga; Yasuo Kogo; Iwao Miyamoto 📂 Article 📅 2006 🏛 Elsevier Science 🌐 English ⚖ 566 KB