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Focused ion beam lithography using Al2O3 resist

✍ Scribed by Tsuneaki Ohta; Toshihiko Kanayama; Masanori Komuro

Publisher: Elsevier Science
Year: 1987
Tongue: English
Weight: 356 KB
Volume: 6
Category: Article
ISSN: 0167-9317
DOI: 10.1016/0167-9317(87)90072-4

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