๐”– Bobbio Scriptorium
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Ion beam lithography using single ions

โœ Scribed by A. Alves; P. Reichart; R. Siegele; P.N. Johnston; D.N. Jamieson


Publisher
Elsevier Science
Year
2006
Tongue
English
Weight
270 KB
Volume
249
Category
Article
ISSN
0168-583X

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Ion beam lithography (IBL) is a very useful tool for the fabrication of nano-structures. In order to expand the applicability of IBL by using highly charged ions (HCI), Ar 1+ and Ar 9+ ions were irradiated onto spin-on-glass (SOG) through a stencil mask. The step structure was successfully fabricate