𝔖 Bobbio Scriptorium
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Ion beam lithography

✍ Scribed by Kenji Gamo; Susumu Namba


Publisher
Elsevier Science
Year
1984
Tongue
English
Weight
922 KB
Volume
15
Category
Article
ISSN
0304-3991

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πŸ“œ SIMILAR VOLUMES


Ion beam lithography using single ions
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Application of highly charged Ar ion bea
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Ion beam lithography (IBL) is a very useful tool for the fabrication of nano-structures. In order to expand the applicability of IBL by using highly charged ions (HCI), Ar 1+ and Ar 9+ ions were irradiated onto spin-on-glass (SOG) through a stencil mask. The step structure was successfully fabricate

Masked ion beam lithography for proximit
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