High-resolution focused ion beam lithography
β Scribed by Shinji Matsui; Yoshikatsu Kojima; Yukinori Ochiai; Toshiyuki Honda; Katsumi Suzuki
- Book ID
- 107920442
- Publisher
- Elsevier Science
- Year
- 1990
- Tongue
- English
- Weight
- 572 KB
- Volume
- 11
- Category
- Article
- ISSN
- 0167-9317
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π SIMILAR VOLUMES
We show how Focused Ion Beam irradiation can be used to modify the magnetic properties of a thin Co/Pt layer at a nanometric length-scale. The control of the injected ion dose enables the adjustment of the coercive field and the Curie temperature of the layer on localized parts of the sample. The me
A conventional TEWSTEM has been used for the fabrication of -10 nm-size structures by electron-beam lithography. The electron microscope provides a versatile tool for studying the lithographic process with control of the beam energy, current, and profile combined with the ability to image both the p