Maskless ion beam lithography system

✍ Scribed by Y. Lee; R.A. Gough; T.J. King; Q. Ji; K.N. Leung; R.A. McGill; V.V. Ngo; M.D. Williams; N. Zahir

• Publisher: Elsevier Science
• Year: 1999
• Tongue: English
• Weight: 875 KB
• Volume: 46
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/s0167-9317(99)00042-8

✦ Synopsis

A new type of focused ion beam column is being designed to achieve a beam spot size of less than 100nm. This column is compact and can be operated with multiple beams to enhance the throughput for lithography applications. The column has been coupled with a multicusp ion source for beam transmission and high voltage holdup testing. The 2.5-cm long column can be used to accelerate different kinds of ion beams up to 45 keV.